- [ February/10/2004 ]
- Tokyo Ohka Kogyo Co., Ltd. Will Exhibit at SEMICON® Korea 2004
This exhibition was successfully ended. We are grateful to you for your visiting our booth.
| Exhibit Dates : |
Wednesday, February 18 - Friday, February 20, 2004 |
| Exhibit Products : |
- State of the Art Photoresists for Semiconductor
- For ArF Excimer Laser (193nm)
- For KrF Excimer Laser (248nm)(HAER / LAER)
- For i-line (365nm, Chemically Amplified Positive Photoresist)
(Thick Film Process, Hight energy Implant)
- Resolution Enhancing Process for Semiconductor
- Materials for Resolution Enhancing Process
(For Electron Beam / ArF / KrF / i-line)
- Materials for Multilayer Process
(Photoresist / Middle Layer Material / Bottom Layer Material)
- Materials for Bilayer Process
(Photoresist / Bottom Layer Material)
- Low-k Materials & Equipment
- Low-k Spin-on Planarization Source
- Stripping Solution for Low-k Materials
(Etching Residues [Contains Si / Cu], Photoresist / Etching Residues [Contains Si / Cu])
- Spin-Coater for Low-k Materials
- Ashing Machine for Low-k Materials
- Process Equipment for Semiconductor
- Low-Damage Ashing Machine for 200mm Wafer
- Thick Film Forming Coater
- High Speed Photoresist Developing Machine
- Vacuum UV Hardening Machine
- Materials for MEMS / CSP / BUMP (Package Modules)
- High Thick Film Chemically Amplified Positive Photoresist for Gold Bumping
- High Sensitivity Thick Film Positive Photoresist for Thick Film Plating
- High Thick Film Negative Photoresist for CSP Flip Chip
- Super Thick Film Dry Film Resist for Plating
- High Flexibility Positive Photoresist for TAB / COF
- Through Hole Back-Coated Resist
- Equipment for MEMS / CSP / BUMP (Package Modules)
- Spin Coater for High Thick Film Forming Process
- Coater “Spinless” for Super Thick Film Forming Process
- High Speed Photoresist Developing Machine
- Descum Ashing Machine
- Vacuum UV Hardening Machine
- Materials for Flat Panel Display
- Photoresist for TFT LCD (For g-line / i-line / 4 Mask)
- Photoresist for Forming Black Matrix of Color Filter
- Material for Planarization
- Photoresist for Cr of Color Filter Etching Process
- Dry Film Resist for PDP Barrier Rib Forming Sand-Blast Process
- Dry Film Resist for PDP ITO / Bus Electrode / Address Electrode Etching Process
- Photo-Phosphor Paste for PDP
- Photo-Vehicle for PDP
- Liquid Resin for Glass-Frit Dispersion for PDP Panel Sealing Process
- Photoresist for Forming Cathode Separator (Reverse Taper Shape) of Organic EL Display
- Photoresist for Forming Insulator of Organic EL Display
- Process Equipment for LCD
- Coater System Spinless
(Applicable to 1,500 by 1,850mm class substrate)
- Coater System Spinless
(Applicable to 1,100 by 1,300mm class substrate)
- Coater System Coat & Spin
(Applicable to 1,100 by 1,300mm class substrate)
- oater / Developer System Coat & Spin
(Applicable to 1,100 by 1,300mm class substrate)
- Coater / Developer System Coat & Spin
(Applicable to 650 by 750mm class substrate)
|
| Contact : |
- Seoul Marketing Office
- TEL. +82-2-588-5035 FAX. +82-2-588-5036
* Business Hours 9:00 - 12:00 13:00 - 18:00 in Korea
(Except for Saturday, Sunday, National Holidays and Our Company Holidays)
- Materials for Semiconductor
- Electronic Material Marketing Division 2
TEL. +81-44-435-3001 FAX. +81-44-435-3021
- Process Equipment for Semiconductor / LCD
- Semiconductor & LCD Equipment Marketing Division
TEL. +81-44-435-3001 FAX. +81-44-435-3021
- Materials for LCD
- LCD Material Marketing Division
TEL. +81-44-435-3002 FAX. +81-44-435-3022
- Materials for PDP
- PDP Packaging Material Marketing Division
TEL. +81-44-435-3002 FAX. +81-44-435-3022
- Materials for MEMS / CSP / BUMP (Package Modules)
- PDP Packaging Material Marketing Division
TEL. +81-44-435-3002 FAX. +81-44-435-3022
* Business Hours 8:45 - 12:00 13:00 - 17:30 in Japan
(Except for Saturday, Sunday, National Holidays and Our Company Holidays) |
