- [ February/13/2004 ]
- Tokyo Ohka Kogyo Co., Ltd. Will Exhibit at SPIE'S MICROLITHOGRAPHY 2004 Exhibition
OHKA AMERICA, INC., our fully owned subsidiary, exhibited at SPIE'S MICROLITHOGRAPHY 2004 Exhibition. This exhibition was successfully ended. We are grateful to you for your visiting our booth.
| Exhibit Dates : |
Tuesday, February 24 - Wednesday, February 25, 2004 |
| Exhibit Products : |
- State of the Art Photoresists for Semiconductor
- For Electron Beam
(For EB Mask / LEEPL [Bilayer / Trilayer])
- For F2 Excimer Laser (157nm)
- For ArF Excimer Laser (193nm)
- For KrF Excimer Laser (248nm)
(HAER / LAER / Negative Tone)
- For Most Advanced i-line (365nm)
- Resolution Enhancing Process for Semiconductor
- Materials for Immersion Photolithography Process
(For ArF)
- Materials for Resolution Enhancing Process
(For Electron Beam / ArF / KrF / i-line)
- Materials for Multilayer Process
(Photoresist / Middle Layer Material / Bottom Layer Material)
- Materials for Bilayer Process
(Photoresist / Bottom Layer Material)
- Photolithography Relative Material
|
| Contact : |
- Mr. Alan Kozlowski
- General Manager, OHKA AMERICA, INC.
alan.kozlowski@ohka.com
TEL. +1-408-934-8945
|
