TOKYO OHKA KOGYO CO., LTD. (TOK) provides chemical products, such as photoresist, and equipment for semiconductors and liquid crystal displays.

Semiconductor Manufacturing Field

Semiconductor Manufacturing Field

Products

Microprocess technology, such as photoresist,
is supporting advancement in the electronics field.

From micrometer to cutting-edge nanometer features, TOK provides optimal photoresists and related equipment tailored to the production of various semiconductor devices

Semiconductor devices are used for a wide range of products including information terminals such as smartphones and tablets, home electrical appliances, PCs, automobiles and precision machinery. They are also used for the most advanced technologies such as servers and super computers. Along with the increasing flexibility of applications, a wide variety of semiconductor devices have been developed.

In order to respond to wider and diversifying market needs, we have released new types of photoresists such as g-line / i-line photoresists for submicron level processing, and KrF/ ArF photoresists for nanometer level processing. We are also actively working to develop photoresists for ArF immersion as well as new products for EUV / electron beam which many consider to be the nextgeneration light sources.

At the same time, we are working to develop a state-of-the-art photoresist based on innovative ideas and careful verifications through various research activities. The new photoresist will enable ultra-microprocessing technology targeting the 10 nanometer scale. In addition to the above products, we also offer developing solutions, stripping solutions, thinners and other high purity chemicals. We support the semiconductor manufacturing industry with our comprehensive strength of combining advanced processing technologies and various types of processing equipment.

Semiconductor Manufacturing Texture
Semiconductor Manufacturing Materials
coating machines CS series

Glossary

g-line, i-line, KrF excimer laser, ArF excimer laser

Names of an exposure light source in the photolithography process. In order to allow even more microscopic processing, the wavelengths have been shortened as follows:
g-line (wavelength: 436 nm) -> i-line (wavelength: 365 nm) -> KrF excimer laser (wavelength: 248 nm) -> ArF excimer laser (wavelength: 193 nm)

Immersion exposure technology

Technology that enables even more microscopic processing by using the refractive index of a liquid. Exposure is carried out by placing a liquid between the lens of the exposure machine and the photoresist to be exposed.

EUV

Extreme-ultraviolet with a wavelength of 13.5 nm that is expected to be the next exposure light source to ArF excimer laser.

Electron beam

Radiation generated from the cathode.

Semiconductor Manufacturing Field