TOKYO OHKA KOGYO CO., LTD. (TOK) provides chemical products, such as photoresist, and equipment for semiconductors and liquid crystal displays.

History

History

Corporate Information

Our history of the development and progress of precision
processing technologies based on photolithography.

1936-1979

1936AprilStarted as TOKYO OHKA RESEARCH LABORATORY.
1940OctoberReorganized as a joint-stock company, TOKYO OHKA KOGYO CO., LTD.
1967JanuarySAGAMI PLANT (present SAGAMI OPERATION CENTER) began operations.

1980-1989

1980NovemberHeld the 1st TOKYO OHKA SEMINAR (semiconductor technology seminar).
1981JuneUTSUNOMIYA PLANT (our first full-scale mass production plant for photoresists used in semiconductor manufacturing) began operations.
1983FebruarySAGAMI SECOND PLANT (present SHONAN TECHNICAL CENTER) began operations.
DecemberKUMAGAYA PLANT (plant for manufacturing industrial chemicals) began operations.
1984JanuaryYAMANASHI PLANT (exclusive plant for manufacturing photopolymer printing plates) began operations.
OctoberPROCESS EQUIPMENT PLANT (within SAGAMI SECOND PLANT / present SHONAN TECHNICAL CENTER) began operations.
DecemberASO PLANT began operations.
1986JulyListed in the Second Section of Tokyo Stock Exchange.
1987MarchEstablished OHKA AMERICA, INC. in California, U.S.
JuneGOTEMBA PLANT began operations.
SeptemberEstablished OHKA (UK) LTD. (present OHKA EUROPE LTD.).
1989AprilEstablished T.O.K. INTERNATIONAL, INC. in Oregon, U.S.
OctoberIKUNO PLANT began operations.
NovemberHeld the 10th TOKYO OHKA SEMINAR.

1990-1995

1990SeptemberListed in the First Section of Tokyo Stock Exchange.
NovemberHeld the 1st TOKYO OHKA SEMINAR in Korea.
1992OctoberEstablished TOK ENGINEERING CO., LTD.
DecemberMerged OHKA AMERICA, INC. and T.O.K. INTERNATIONAL, INC. (OHKA AMERICA, INC. / present TOKYO OHKA KOGYO AMERICA, INC.).
1993MayOREGON PLANT of OHKA AMERICA, INC. (present TOKYO OHKA KOGYO AMERICA, INC.) began operations.
1994FebruaryKORIYAMA PLANT began operations.
MayHeld the 1st TOKYO OHKA SEMINAR in Taiwan.
1995MayEstablished TOK ITALIA S.p.A.

1996-1999

1996JulyAcquired ISO 9002 registration for GOTEMBA PLANT and SAGAMI OPERATION CENTER.
OctoberDry Film Resist plant of TOK ITALIA S.p.A. began operations.
1997FebruaryCompleted construction of new research building in SAGAMI OPERATION CENTER.
MarchEstablished TOK TECHNO SERVICE CO., LTD.
MayCompleted construction of our first oversea photoresist manufacturing plant for semiconductor fabrication at OREGON PLANT of OHKA AMERICA, INC.
DecemberCompleted the third phase construction (manufacturing plant of photoresists for deep-UV) of KORIYAMA PLANT, and started the manufacture.
1998JanuaryEstablished TOK TAIWAN CO., LTD.
AprilCompleted construction of new research building in SHONAN PLANT (present SHONAN TECHNICAL CENTER).

1999

 

 

MayAcquired ISO 9002 registration for all the plants of Manufacturing Department.
NovemberHeld the 20th TOKYO OHKA SEMINAR.
Stripper / thinner manufacturing plant of TOK TAIWAN CO., LTD. began operations.
Acquired ISO 14001 registration for KORIYAMA, UTSUNOMIYA and GOTEMBA PLANT.

2000-

2000 AugustCompleted construction (July) of the new headquarters building at the site that its Kawasaki Plant had used to stand, and has moved to the new headquarters.
2001 FebruaryDeveloped TARF-P series (High-resolution, positive type photoresist for ArF excimer lasers).
MarchDeveloped DELS series (Dielectric Layer sheet for PDP).
OctoberCompleted construction of ELASLON manufacturing line in YAMANASHI PLANT.
DecemberDeveloped TELR-P series (Positive type photoresist for Organic EL Display).

2002 

 

 

MarchDeveloped TR63000 (Large square substrate coater / Developer system).
Developed OEBR-CAN021 (Negative type photoresist for electron beams).
AugustEstablished SINGAPORE REPRESENTATIVE OFFICE.
Completed construction of PDP manufacturing material production plant in KORIYAMA PLANT.
OctoberEstablished SHANGHAI REPRESENTATIVE OFFICE.
2003 FebruaryCompleted construction of new research building in SAGAMI OPERATION CENTER.
OctoberSEOUL MARKETING OFFICE began operations.
NovemberDISTRIBUTION CONTROL CENTER began operations.
DecemberDeveloped TMMR (Permanent photoresist for MEMS).
2004 SeptemberEstablished TOK KOREA CO., LTD.
OctoberEstablished CHANG CHUN TOK (CHANGSHU) CO., LTD.
2005 DecemberEstablished TOKYO OHKA KOGYO EUROPE B.V.

2006 

 

JanuaryOHKA AMERICA, INC. has changed its name to TOKYO OHKA KOGYO AMERICA, INC.
FebruaryOHKA EUROPE LTD. has transferred all its business to TOKYO OHKA KOGYO EUROPE B.V.
Completed construction of new research building in SAGAMI OPERATION CENTER.
2007 AprilCompleted construction of new research building in SAGAMI OPERATION CENTER.
2008 MarchCompleted construction of office building in Aso Pant.
2008 NovemberDeveloped TWM/TWR series (wafer handling system for processing through-silicon vias).
2008 DecemberDeveloped TR165000FC series (float coating system).
2009 AprilCompleted construction of stripping solution manufacturing plant in TOKYO OHKA KOGYO AMERICA, INC. (Oregon Plant).
JuneDeveloped EPLUS (diffusion source for photovoltaic).
2011 JanuaryNewly organized Marketing Division, Marketing Department.
JuneNewly organized New Business Development Division, New Business Development Department.
NovemberBuilt a new production line of semiconductor photoresist in Koriyama plant.
2012 AugustEstablished TOK ADVANCED MATERIALS CO., LTD.
2013 NovemberBegan development, manufacturing and sales at TOK ADVANCED MATERIALS CO., LTD.