History

Our history of the development and progress of precision processing technologies based on photolithography.

1936-1979

1936 April Started as TOKYO OHKA RESEARCH LABORATORY.
1940 October Reorganized as a joint-stock company, TOKYO OHKA KOGYO CO., LTD.
1967 January SAGAMI PLANT (present SAGAMI OPERATION CENTER) began operations.

1980-1989

1980 November Held the 1st TOKYO OHKA SEMINAR (semiconductor technology seminar).
1981 June UTSUNOMIYA PLANT (our first full-scale mass production plant for photoresists used in semiconductor manufacturing) began operations.
1983 December KUMAGAYA PLANT (plant for manufacturing industrial chemicals) began operations.
1984 January YAMANASHI PLANT (exclusive plant for manufacturing photopolymer printing plates) began operations.
October PROCESS EQUIPMENT PLANT (within SAGAMI SECOND PLANT / present SHONAN OPERATION CENTER) began operations.
December ASO PLANT began operations.
1986 July Listed in the Second Section of Tokyo Stock Exchange.
1987 March Established OHKA AMERICA, INC. in California, U.S.
June GOTEMBA PLANT began operations.
September Established OHKA (UK) LTD. (present OHKA EUROPE LTD.).
1989 April Established T.O.K. INTERNATIONAL, INC. in Oregon, U.S.
October IKUNO PLANT began operations.
November Held the 10th TOKYO OHKA SEMINAR.

1990-1995

1990 September Listed in the First Section of Tokyo Stock Exchange.
November Held the 1st TOKYO OHKA SEMINAR in Korea.
1992 October Established TOK ENGINEERING CO., LTD.
December Merged OHKA AMERICA, INC. and T.O.K. INTERNATIONAL, INC. (OHKA AMERICA, INC. / present TOKYO OHKA KOGYO AMERICA, INC.).
1993 May OREGON PLANT of OHKA AMERICA, INC. (present TOKYO OHKA KOGYO AMERICA, INC.) began operations.
1994 February KORIYAMA PLANT began operations.
May Held the 1st TOKYO OHKA SEMINAR in Taiwan.
1995 May Established TOK ITALIA S.p.A.

1996-1999

1996 July Acquired ISO 9002 registration for GOTEMBA PLANT and SAGAMI OPERATION CENTER.
October Dry Film Resist plant of TOK ITALIA S.p.A. began operations.
1997 February Completed construction of new research building(C6) in SAGAMI OPERATION CENTER.
March Established TOK TECHNO SERVICE CO., LTD.
May Completed construction of our first oversea photoresist manufacturing plant for semiconductor fabrication at OREGON PLANT of OHKA AMERICA, INC.
December Completed the third phase construction (manufacturing plant of photoresists for deep-UV) of KORIYAMA PLANT, and started the manufacture.
1998 January Established TOK TAIWAN CO., LTD.
April Completed construction of new research building in SHONAN PLANT (present SHONAN OPERATION CENTER).

1999

May Acquired ISO 9002 registration for all the plants of Manufacturing Department.
November Held the 20th TOKYO OHKA SEMINAR.
Stripper / thinner manufacturing plant of TOK TAIWAN CO., LTD. began operations.
Acquired ISO 14001 registration for KORIYAMA, UTSUNOMIYA and GOTEMBA PLANT.

2000-2019

2000 August Completed construction (July) of the new headquarters building at the site that its Kawasaki Plant had used to stand, and has moved to the new headquarters.
2001 February Developed TARF-P series (High-resolution, positive type photoresist for ArF excimer lasers).
March Developed DELS series (Dielectric Layer sheet for PDP).
October Completed construction of ELASLON manufacturing line in YAMANASHI PLANT.
December Developed TELR-P series (Positive type photoresist for Organic EL Display).

2002

March Developed TR63000 (Large square substrate coater / Developer system).
Developed OEBR-CAN021 (Negative type photoresist for electron beams).
August Established SINGAPORE REPRESENTATIVE OFFICE(present SINGAPORE OFFICE).
Completed construction of PDP manufacturing material production plant in KORIYAMA PLANT.
October Established SHANGHAI REPRESENTATIVE OFFICE.
2003 February Completed construction of new research building(B4) in SAGAMI OPERATION CENTER.
October SEOUL MARKETING OFFICE began operations.
November DISTRIBUTION CONTROL CENTER began operations.
December Developed TMMR (Permanent photoresist for MEMS).
2004 September Established TOK KOREA CO., LTD.
October Established CHANG CHUN TOK (CHANGSHU) CO., LTD.
2005 December Established TOKYO OHKA KOGYO EUROPE B.V.
2006 January OHKA AMERICA, INC. has changed its name to TOKYO OHKA KOGYO AMERICA, INC.
February OHKA EUROPE LTD. has transferred all its business to TOKYO OHKA KOGYO EUROPE B.V.
Completed construction of new research building(A1) in SAGAMI OPERATION CENTER.
2007 April Completed construction of new research building(B3) in SAGAMI OPERATION CENTER.
2008 March Completed construction of office building in Aso Pant.
November Developed TWM/TWR series (wafer handling system for processing through-silicon vias).
December Developed TR165000FC series (float coating system).
2009 April Completed construction of stripping solution manufacturing plant in TOKYO OHKA KOGYO AMERICA, INC. (Oregon Plant).
June Developed EPLUS (diffusion source for photovoltaic).
2011 January Newly organized Marketing Division, Marketing Department.
June Newly organized New Business Development Division, New Business Development Department.
November Built a new production line of semiconductor photoresist in Koriyama plant.
2012 August Established TOK ADVANCED MATERIALS CO., LTD.
2013 November Began development, manufacturing and sales at TOK ADVANCED MATERIALS CO., LTD.
2014 November TONGLUO PLANT of TOK TAIWAN CO., LTD.began operations.
2016 November Expanded facilities of TONGLUO PLANT
2017 March Developed TAPM (high-functional films).
2018 January Completed construction of office building in Koriyama Pant.
April Newly organized AI Promotion Division.
September Established SHANGHAI Office of CHANG CHUN TOK (CHANGSHU) CO., LTD.
2019 April Completed construction of new research buildings(B6 and C1) in SAGAMI OPERATION CENTER.
July Opened joint laboratory with Yokohama City University.

2020-

2020 January Newly organized Strategic Alliance Division.
2021 January EstablishedTOK CHINA CO., LTD.
May EstablishedTOKYO OHKA KOGYO CO., LTD. Europe Branch
2023 March Transfered equipment businessto AIMECHATEC, Ltd.