New Business Field
Under the “Challenge for the Future!” slogan, TOK has set up the New Business Development Dept. combined sales and technical division.
TOK offers unique and high value-added materials ,using our functional polymer design/manufacturing technologies cultivated in photolithography field, through open innovation with our customers and third parties.
For your technology needs, TOK offers high value-added materials which cultivated by our technology and know-how.
Structure Materials
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Photo patternable permanent materials for structure fabrication（TMMF ®/ TMMR®）
Negative tone photo patterable permanent film with high resolution and high adhesion, enabling the formation of high aspect ratio patterns for MEMS (Dry film and liqud type)
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Photo Patternable Adhesives Materials
Pattern & Adhesive in One Material
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UV Nanoimprint Materials
UV imprintable materials which shows high RI, low RI, and solvent-free high RI materials having excellent reliability and good transparency.
Surface Modification Materials
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Hydrophilic Coating Materials
Hydrophilicity can be applied to high contact angle substrates without pretreatment
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Photo Patternable Hydrophobic / Oleophobic Materials
The material provides hydrophobic / Oleophobic fine patterns by photolithography
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Hydrophilic Coating Materials (Chemical Bonding Type)
The material can be formed a hydrophilic nano level thin film only by coating on glass or oxide film
Microprocessing Film
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Porous Polyimide Film
Unique and Uniformed pore structure
mmWave Absorber
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Thin Film mmWave Absorber
High Performance
with less than 300 nm thick film
High Heat Resistance and High Transparency Polyimide Film
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Varnish for high heat resistance and high transparency polyimide film
Varnish for high heat resistance and high transparency polyimide film. Provided in the form of polyamic acid.