New Business Field
Under the “Challenge for the Future!” slogan, TOK has set up the New Business Development Dept. combined sales and technical division.
TOK offers unique and high value-added materials ,using our functional polymer design/manufacturing technologies cultivated in photolithography field, through open innovation with our customers and third parties.
UV Nanoimprint Materials
TOK offers various UV imprintable materials which shows high RI, low RI, and solvent-free high RI materials having excellent reliability and good transparency. These materials can be applicable for various type of optical devices(e.g. DOE, AR waveguides, and 3D sensors). A complicated fine structure and micro lens pattern can also be formed.
Lineup
| Name | RI @589nm | T% @589nm | Haze | Coating method |
|---|---|---|---|---|
TPIRTM-2000S NL (Commercialized) | 1.50 | > 99% | < 0.1% | Spin ~2 µm |
High RI grade (Prototype) | 1.76 | > 99% | < 0.1% | Spin ~3 µm |
Solvent-Free High RI grade (Prototype) | 1.71 | > 95% | < 0.1% | Spin ~50 µm, Dispensing |
Low RI grade (Prototype) | 1.36 | > 99% | < 0.1% | Spin ~4 µm |
Applications
- Diffractive Optics Elements
- Waveguides for AR devices
- Optical diffusers for 3D sensors
TPIRTM-2000S NL
Ultra-High Durability UV NIL material, RI. 1.50＠589nm
Extremely High Reliabilities (e.g. high temperature, humidity, and thermal shock)
References
Download White paper
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