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Spinless HOME “Spinless” Coating with the “Spinless” Features of the “Spinless”

Coating with the “Spinless”

The Non-spin coater “Spinless” applies a coating of photoresist by scanning the substrate surface with a high-precision slit nozzle.
Simplified process flow
Spinless
1. Coat Unit 2. Vacuum Dry Unit Spinless_Substrate input1. Photoresist coating 2. Drying to a certain extent under reduced pressureOutput to the exposure process
1. Coat Unit 2. Vacuum Dry Unit

Coat & Spin
1. Coat Unit 2. Rotary Cup Unit 3. Vacuum Dry Unit 4. E.B.R. Unit Coat & Spin_Substrate input1. Photoresist coating 2. Substrate rotation to make the photoresist film uniform 3. Drying to a certain extent under reduced pressure 4. Removal of photoresist from the substrate edgeOutput to the exposure process
1. Coat Unit 2. Rotary Cup Unit 3. Vacuum Dry Unit 4. E.B.R. Unit
Systemize of 3units(Note1), Rotary Cup(Note2), Vacuum Dry and E.B.R. (Note1)Patent No. 3135846(Japan Patent) (Note2)Patent No. 2138977(Japan Patent)

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 We develop a mass-production model jointly with TAZMO Corporation.
*
 The above diagram of coating process is simplified for explanation purposes.
*
 Both processes shown above a simplified process flow. The processes may differ from the actual process.
*
 E.B.R.=Edge Bead Remover
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