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The design rules of transistors and wiring are becoming increasingly small along with the rise in the scales of integration and speed of semiconductor devices. In response to this trend, we have developed a process based on a new concept applying Shrink Assist Film for Enhanced Resolution (SAFIER).
SAFIER makes possible microprocessing a generation ahead even while using today's exposure wave lengths. The process using SAFIER constitutes a landmark type of ultrahigh-resolution technology transcending intergenerational boundaries, and so extends the service life of the existing exposure wave lengths. The process using SAFIER is the technology to blaze new frontiers in higher levels of integration. |
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