SAFIER New Technologies
SAFIER_HOME Process flow Mechanism Features Data
» The process using SAFIER can be performed more than once
It is possible to apply the process using SAFIER over and over times, which result is even finer patterns.

For KrF with TDUR-P7000 Series
Contact Hole 180 nm –› 120 nm

After removal of
SAFIER
130 °C
Initial 1 time 2 times 3 times
Pitch
420 nm
SEM(Pitch 420nm)
Pitch
1,540 nm
SEM(Pitch 1,540nm)
C.D. 180 nm 160 nm 140 nm 120 nm
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