SAFIER New Technologies
SAFIER_HOME Process flow Mechanism Features Data
Mechanism


Utilizing the thermal contraction effect induced by heat treatment on SAFIER itself, the process simultaneously shrinks photoresist patterns while improving their configuration.

Heating Patterning SAFIER Removing

Heat treatment at temperatures below the fluidization temperature of the photoresist Shrinkage of patterns due to the mutual drawing of photoresist side walls together as a result of the thermal contraction effect on SAFIER induced by the heat treatment Removal of SAFIER with pure water after shrinkage of the photoresist patterns


For KrF For ArF For EB
Initial After
Removal of SAFIER		 Initial After
Removal of SAFIER		 Initial After
Removal of SAFIER

3 times treatments
Photoresist SEM_For KrF Photoresist SEM_For KrF Photoresist SEM_For ArF Photoresist SEM_For ArF Photoresist SEM_For EB Photoresist SEM_For EB
C.D. 160.5 nm 141.5 nm C.D. 140 nm 120 nm C.D. 70 nm 41 nm
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