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HOME > Introduction of Technologies > Materials for Nano Imprint

Introduction of Technologies

Introduction of Technologies

Materials for Nano Imprint (Spin-on Inorganic / Organic SiO2 Film)

TOK's cutting-edge technology provides various solutions in nano imprint field for a wide range of customer needs.
HSQ (Inorganic) Material for Nano Imprint
Outstanding Features
Excellent thermal resistance (above 1000 degree C)
Low dielectronic constant (ε =3.0 - 3.1) <400 degree C>
Profiles

Room temperature imprint After removal of mold

After cure
at 300 degree C

After cure
at 800 degree C

After cure
at 1000 degree C
Room temperature imprint After removal of mold After cure at 300 degree C After cure at 800 degree C After cure at 1000 degree C
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