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The history of the rapid advance of such electronic equipment as personal computers and cellular phones is inextricably linked to the equally remarkable development of semiconductors such as IC and LSI. In the field of semiconductor manufacturing where extreme miniaturization is now the norm, TOK has made a very real contribution to the world Offer of cutting-edge products, including photoresists (photosensitive resin); we are very proud of the microprocess technology developed in this field and regard these achievements as the flagship of our company. From g-line and i-line photoresists to deep-UV (KrF excimer laser / 248 nm) and deep-UV (ArF excimer laser / 193 nm) photoresists, TOK provides a broad range of support to our customers by offering an unrivalled and comprehensive lineup of products and services. Furthermore, in order to respond to the next generation and advancing miniaturization of technology, such as deep-UV (ArF excimer laser / 193 nm) with immersion technology, EUV (extreme ultraviolet rays) and electron beam exposure, we are actively promoting and establishing the very latest molecule level design and new technology. The promotion of diverse photolithography materials and manufacturing equipment in addition to photoresists have given us a strong base from which to make full use of our advantages and enables us to offer unique solutions incorporating many different approaches, and often involving combinations of materials. When coupled with our new ideas and proposals, we are able to offer the optimized microprocess technology in response to our customers' needs. |
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