- [ February/14/2003 ]
- Tokyo Ohka Kogyo Co., Ltd. Will Exhibit at SPIE'S MICROLITHOGRAPHY 2003 Exhibition
OHKA AMERICA, INC., our fully owned subsidiary, exhibited at SPIE'S MICROLITHOGRAPHY 2003 Exhibition. This exhibition was successfully ended. We are grateful to you for your visiting our booth.
| Exhibit Dates : |
Tuesday, February 25 - Wednesday, February 26, 2003 |
| Exhibit Products : |
- State of the Art Photoresists for Semiconductor
- For Electron Beam(EPL / For Cr Mask)
- For F2 Excimer Laser (157nm)
- For ArF Excimer Laser (193nm)
- For KrF Excimer Laser (248nm)
(HAER / LAER / For Implant Process / For BARC Process)
- For Most Advanced i-line (365nm)
- Resolution Enhancing Process for Semiconductor
- Materials for Resolution Enhancing Process
(For Electron Beam / ArF / KrF / i-line)
- Materials for Super Critical State Dry Process
(For ArF)
- Materials for Multilayer Process
(Photoresist / Middle Layer Material / Bottom Layer Material)
- Materials for Bilayer Process
(Photoresist / Bottom Layer Material)
|
| Contact : |
- Mr. Alan Kozlowski
- National Sales Manager, OHKA AMERICA, INC.
alan.kozlowski@ohka.com
TEL. +1-408-934-8945
|
